customer satisfaction is our pursuit
SATISFACTION
10 years of experience
more than 10 years of production experience, the products run through many industries, covering every industrial city.
technical support
to help customers provide product solutions and technologies
technical guidance, after-sales maintenance, etc.
covers the whole country
our products are sold in 25 cities nationwide, and our after-sales online stores cover the whole country.
high cost performance
our products have high cost performance in the market and have won the recognition of our customers.
Our products
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Silicon tetrafluoride（SiF4）
It is used to produce organic silicide, fluosilicic acid and aluminum fluoride. It is also used in chemical analysis, oil well drilling, catalyst, fumigant, etc.¥ 0.00Buy Now
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Hexafluorobutadiene（C4F6）
Perfluoro butadiene / C4F6, as a high-efficiency dry etching gas with extremely low greenhouse effect GWP and environmental protection, has faster etching rate, higher selectivity and higher accuracy, and is more suitable for the etching process with high aspect ratio.¥ 0.00Buy Now
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Trifluoromethanesulfonic acid(CF3SO3H)
Trifluoromethanesulfonic acid has strong corrosivity and hygroscopicity, and is widely used in medicine, chemical industry and other industries. Such as nucleosides, antibiotics, steroids, proteins, carbohydrates, vitamin synthesis, silicone rubber modification, etc.
It can also be used as a catalyst for isomerization and alkylation. Preparation of 2,3-dihydro-2-indenone and tetrahydronaphthone. Remove glycosides from glycoproteins.¥ 0.00Buy Now
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Hexafluoroethane（C2F6）
Hexafluoroethane can be used in a multifunctional etching technology, which is commonly used in the production of semiconductors. It can be used for selective etching of metal silicides and metal oxides relative to their metal substrates. In addition, it is also used to etch silicon dioxide on silicon.¥ 0.00Buy Now
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Carbon tetrafluoride（CF4）
Carbon tetrafluoride is the most widely used plasma etching gas in the microelectronic industry. It can be widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten. It is also widely used in the surface cleaning of electronic devices, solar cell production, laser technology, low-temperature refrigeration, leakage inspection, detergent in printed circuit production, etc.¥ 0.00Buy Now
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Trifluoromethane（CHF3）
Electronic grade fluoroform is one of the plasma etching gases widely used in microelectronic industry, especially for the etching of silica film. It has the advantages of fast etching speed and good selectivity. In addition, fluoroform is also used in low-temperature mixed refrigerants, organic synthesis intermediates, infrared detector direct coolant, etc.¥ 0.00Buy Now
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chlorine trifluoride（CLF3）
In the semiconductor industry, chlorine trifluoride is used to clean the reaction chamber of chemical vapor deposition. It has the advantage that the semiconductor substance attached to the bulkhead can be removed without dismantling the reaction chamber. Unlike other alternative cleaners, chlorine trifluoride does not need to undergo plasma activation before use, because the residual heat in the reaction chamber is enough to decompose it and react with semiconductor materials.¥ 0.00Buy Now
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Nitrogen trifluoride（NF3）
Nitrogen trifluoride is an excellent plasma etching gas in microelectronic industry. For etching silicon and silicon nitride, nitrogen trifluoride has higher etching rate and selectivity than carbon tetrafluoride and the mixture of carbon tetrafluoride and oxygen, and has no pollution to the surface. Nitrogen trifluoride has very excellent etching rate and selectivity, leaving no residue on the surface of the etched object, It is also a very good cleaning agent.¥ 0.00Buy Now
choose ours3big advantage
OUR STRENGTHS
business model
to provide better service to each customer with heart
> the company is a professional manufacturer and high-tech enterprise in development, production and sales. The company's products are developing in the direction of standardization and serialization, while constantly developing new products.
No.1
No.2
equipment advantages
to provide better service to each customer with heart
> the company has a high-gloss manufacturing process, tailor-made cost-effective subdivided products to ensure the quality and quality of each product.
No.3
technical support
to provide better service to each customer with heart
> The dedicated service model adopts a team service model for individual projects to provide customers with professional and detailed service quality.
company profile
COMPANY PROFILE
Daten comes from a Chinese technology company,We supply all over the world,for example calibration gas,SF6,CF4,CHF3,C2F6,CLF3,C4F8,ECD GAS,Our products implement high standards, high accuracy and high stability,We serve thousands of high-tech enterprises, universities and research institutes,We are a trustworthy partner,In the future, we will continue to strive to provide better services and products for the world. We look forward to cooperating with you!
factory environment
news information
NEWS AND INFORMATION
national hotline:
How to Contact Us
datenhome@163.com
datenhome@163.com
Because of the time zone difference
We recommend using email to contact us for the first time
Thanks for your cooperation
DATEN-GAS
1849220271
