Carbon tetrafluoride（CF4）
Carbon tetrafluoride is the most widely used plasma etching gas in the microelectronic industry. It can be widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten. It is also widely used in the surface cleaning of electronic devices, solar cell production, laser technology, low-temperature refrigeration, leakage inspection, detergent in printed circuit production, etc.
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