chlorine trifluoride（CLF3）
In the semiconductor industry, chlorine trifluoride is used to clean the reaction chamber of chemical vapor deposition. It has the advantage that the semiconductor substance attached to the bulkhead can be removed without dismantling the reaction chamber. Unlike other alternative cleaners, chlorine trifluoride does not need to undergo plasma activation before use, because the residual heat in the reaction chamber is enough to decompose it and react with semiconductor materials.
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