Nitrogen trifluoride（NF3）
Nitrogen trifluoride is an excellent plasma etching gas in microelectronic industry. For etching silicon and silicon nitride, nitrogen trifluoride has higher etching rate and selectivity than carbon tetrafluoride and the mixture of carbon tetrafluoride and oxygen, and has no pollution to the surface. Nitrogen trifluoride has very excellent etching rate and selectivity, leaving no residue on the surface of the etched object, It is also a very good cleaning agent.
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